Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4941 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66795 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-332 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-49 |
filingDate |
2014-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2015-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34b9c8265a99cf07b315b18a6d8015e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e09f937e3e0db8921d39c2aee21f255e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_294c40d2e0cd892c7a99a2c53b43368f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f5a583b63591e1fd7f54e87da4a8aedc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66239d340e39d6fe86db674a101108ac |
publicationDate |
2015-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-9034698-B2 |
titleOfInvention |
Semiconductor device manufacturing method |
abstract |
A semiconductor device manufacturing method includes exciting a processing gas containing a HBr gas and a Cl 2 gas within a processing chamber that accommodates a target object including a substrate, regions made of silicon, which are protruded from the substrate and arranged to form a gap, a metal layer formed to cover the regions, a polycrystalline silicon layer formed on the metal layer, and an organic mask formed on the polycrystalline silicon layer. The Cl 2 gas is supplied at a flow rate of about 5% or more to about 10% or less with respect to a flow rate of the HBr gas in the processing gas. |
priorityDate |
2013-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |