| abstract |
A method for manufacturing thin films for a battery device. The method includes vaporizing a precursor material from a liquid source to form droplets ranging from, for example, about 10 microns to about 20 microns. Thereafter, the method includes subjecting the droplets from about 10 to about 20 microns to a megasonic energy source to cause formation of a plurality of smaller droplets ranging from, for example, about 0.25 micron to about 5 microns which are then directed to a heated substrate, where through a heterogeneous reaction a film of material overlying the surface region is formed. The method includes irradiating (e.g., ultra-violet, infra-red, or plasma) the film of material using electromagnetic radiation to process the film to cause a recrystallization of the film to form larger sized crystalline materials. Optionally, the method includes sequentially performing the vaporizing, reacting/releasing, and irradiating to build up a thickness of the film of material. |