http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8999194-B1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c515136b556c70cd53fd21a9723abedb |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-067 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-16 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-06 |
filingDate | 2014-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2015-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d6e19a0daffb7381270191c0c963b89 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f2b2828fe33587ee237e53abd3e6b63 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72e03d933336939c63d3dcb487fcedd6 |
publicationDate | 2015-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-8999194-B1 |
titleOfInvention | Etching solution capable of effectively reducing galvanic effect |
abstract | The present invention is to provide an etching solution capable of effectively reducing Galvanic effect, wherein the etching solution is obtained by way of dissolving an etchant and a nitrogen containing five-member heterocyclic compound in water. Thus, when at least one first metal (e.g., gold) and at least one second metal (e.g., copper) disposed on a substrate is treated with a wet etching process by using this etching solution, the nitrogen containing five-member heterocyclic compound would form an organic protecting film on the first metal having higher reduction potential, so as to effectively avoid the second metal from being over etched resulted from the Galvanic effect. |
priorityDate | 2014-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 92.