| abstract |
A layer of material can protect a surface of a passivation layer against damage during a final via plug process. The protective layer can be a conductive bump limiting metallurgy (BLM) base layer and can include titanium tungsten (TiW), though other materials can be employed. Examples include applying the protective layer after formation of a via opening and prior to formation of a via opening, and can include applying more protective material after conductor plug formation to enhance protection. Photosensitive and non-photosensitive passivation layers can be so protected. |