Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f115214a8539f6c1ff729bf3f08e742c http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7a04c9848201a4f3879eae83bb24e8e9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4a25a0b23a1ca46405ec122223928e01 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31722 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0262 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0437 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-31774 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0435 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-317 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3174 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3177 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21K1-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y40-00 |
filingDate |
2010-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2015-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2eacabe81799ca55458a596f2e8e0acb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_48a5936d692c8aace0f2f1b91616e93f |
publicationDate |
2015-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-8987677-B2 |
titleOfInvention |
Charged particle multi-beamlet lithography system, modulation device, and method of manufacturing thereof |
abstract |
The invention relates to a modulation device for use in a charged particle multi-beamlet lithography system. The device includes a body comprising an interconnect structure provided with a plurality of modulators and interconnects at different levels within the interconnect structure for enabling connection of the modulators to one or more pattern data receiving elements. A modulator includes a first electrode, a second electrode, and an aperture extending through the body. The electrodes are located on opposing sides of the aperture for generating an electric field across the aperture. At least one of the first electrode and the second electrode includes a first conductive element formed at a first level of the interconnect structure and a second conductive element formed at a second level of the interconnect structure. The first and second conductive elements are electrically connected with each other. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016155600-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I759664-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I743470-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9530610-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019211072-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10879032-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11232928-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11355302-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11538655-B2 |
priorityDate |
2009-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |