| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a27049c6e8574a0ed014401747896af4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9a14b446c1f87153e6e62987ab91b2f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d033f531ba01961e253a143d80fe39a6 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K2323-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D5-063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1313
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-3016
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D5-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-30 |
| filingDate |
2011-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91cf50031edacd081b9c35ed7e827a23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d5bcdd0430878162138b6d5a684c22c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e230806097440b45c2b08f8327339cdb |
| publicationDate |
2015-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8968836-B2 |
| titleOfInvention |
Electromagnetic wave reflective film and method for producing same |
| abstract |
Method for producing an electromagnetic wave reflective film by a first selective reflection layer forming process of using a transparent substrate; applying a first selective reflection layer forming coating solution on the transparent substrate to form a first selective reflection layer forming layer; irradiating the first selective reflection layer forming layer with ultraviolet rays at a dose in the range of 25 mJ/cm 2 to 800 mJ/cm 2 ; and thereby forming a first selective reflection layer; and a second selective reflection layer forming process of: using a second selective reflection layer forming coating solution; applying the second selective reflection layer forming coating solution on the first selective reflection layer so as to be in direct contact therewith to form a second selective reflection layer forming layer; irradiating the second selective reflection layer forming layer with ultraviolet rays; and thereby forming a second selective reflection layer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10139533-B2 |
| priorityDate |
2010-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |