abstract |
A resist underlayer composition includes a solvent, and an organosilane condensation polymerization product of: a compound represented by the following Chemical Formula 1, a compound represented by the following Chemical Formula 2, and a compound represented by the following Chemical Formula 3,n n[R 1 O] 3 Si—X [Chemical Formula 1]n n[R 2 O] 3 Si—R 3 [Chemical Formula 2]n n[R 4 O] 3 Si—Si[OR 5 ] 3 . [Chemical Formula 3] |