| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_00b6a7d89068f217d1f4efa9a94c5ded
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aa75a7d64084ffac956b138c38971290 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0142
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0132
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N35-085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-8557
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-8411
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00531
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T436-153333 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-272
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N31-221
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-80 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-75 |
| filingDate |
2013-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ff51ded045958319acf6c0840573dc5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5fd577b703be37c0f9adbeecca8e2c1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_866fc4391b3ee987db1135cde043f221 |
| publicationDate |
2015-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8945939-B2 |
| titleOfInvention |
Control over hydrogen fluoride levels in oxide etchant |
| abstract |
The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of hydrofluoric acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the hydrofluoric acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9677998-B2 |
| priorityDate |
2007-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |