http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8940419-B2
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_50e460fc8a88b2124283ae951e94f7c0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_888c17427537b9cb8c9a63f20631067b |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1844 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-858 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-8404 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1651 |
classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-858 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C20-00 |
filingDate | 2011-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2015-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2f43f5f45a43de8cc43e6a1a4a742d2 |
publicationDate | 2015-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-8940419-B2 |
titleOfInvention | Method for production of hard disk substrate and hard disk substrate |
abstract | Provided are a method for production of a hard disk substrate capable of obtaining a smooth surface of a plating film by electroless NiP plating that is not degraded in, but exhibits corrosion resistance against, an acid solution and such a hard disk substrate. The method for production of a hard disk substrate including an electroless NiP plating film, includes the steps of: a first plating step of immersing a substrate in first electroless NiP plating bath containing an additive having a smoothing effect to form a lower layer of the electroless NiP plating film on a surface of the substrate, the lower layer having an average surface roughness smaller than an average surface roughness of the surface; and a second plating step of immersing the substrate on which the lower layer of the electroless NiP plating film is formed in the first plating step in a second electroless NiP plating bath to form an upper layer of the electroless NiP plating film, the upper layer having corrosion resistance against an acid solution. The resulting plating film has a smooth surface that is not degraded in, but exhibits corrosion resistance against, an acid solution. |
priorityDate | 2010-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 79.