| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02263
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45561
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4557
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32577
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2014-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf133a5d5829c70528974f99dfcb8f13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f53fe5174bfc7beacd112c7ef202ac4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c745cc5d8b5cba025d944e864981d9f4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c77499bb17a75c6266165e6de69f06b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd3c2e483cae05ec199c3f676daf62f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ace5e66a38b35b8135525e9108574d3a |
| publicationDate |
2015-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8925562-B1 |
| titleOfInvention |
Substrate processing apparatus and method of manufacturing semiconductor device |
| abstract |
A substrate processing apparatus includes a first gas supply system provided with a source gas supply control unit; a second gas supply system provided with a reactive gas supply control unit; a third gas supply system provided with a cleaning gas supply control unit; a shower head unit including a buffer chamber connected to the gas supply systems and a dispersion plate installed at a downstream side of the buffer chamber; a substrate support installed at a downstream side of the dispersion plate and electrically grounded; a process chamber accommodating the substrate support; a plasma generation unit including a power supply and a switch configured to switch plasma generation between the buffer chamber and the process chamber; and a control unit configured to control the source gas supply control unit, the reactive gas supply control unit and the plasma generation unit. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017159181-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9340879-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015270119-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015214044-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9659767-B2 |
| priorityDate |
2014-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |