| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a34d7d2e0d09a58cb7bf4a04c81162e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-492
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-32 |
| filingDate |
2012-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62a12000f9882561e1a2f0eb6bcd14fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24fd031751304665f5536217c614cf01 |
| publicationDate |
2014-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8889334-B2 |
| titleOfInvention |
Spin-on anti-reflective coatings for photolithography |
| abstract |
Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021212058-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9256128-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9245751-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9543147-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9502231-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9460909-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015111384-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9436086-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10544329-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014273457-A1 |
| priorityDate |
2001-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |