| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8dbb5088cb37b70d19e5a1001a5cd41a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_22882060b6539fcd4b32b687a8f7583c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K2800-413 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K8-8147
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61Q3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K8-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K8-8152 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61Q3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-81
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-04 |
| filingDate |
2006-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ead839ccdcadbe80b6fc3a051e3970c |
| publicationDate |
2014-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8883126-B2 |
| titleOfInvention |
Water-based nail-polish composition |
| abstract |
The water-based nail-polish composition includes a mixture of at least one water-based suspension (A) of hard nanoparticles of an acrylic polymer at a glass transition temperature that is greater than or equal to 55° C., in combination with at least one coalescent and/or plasticizing solvent of the polymer; and at least one water-based suspension (B) of nanoparticles of acrylic monomers, partially cross-linked, that have a film formation temperature of less than 15° C. The water-based composition can also contain a solution (C) of an acrylic polymer of low molecular weight that is less than approximately 20,000, with a high acid value, neutralized to a pH of between 7 and 8.5, approximately. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11400040-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11571380-B2 |
| priorityDate |
2005-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |