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publicationDate 2014-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8846305-B2
titleOfInvention Photolithography method including dual development process
abstract A photolithography method includes coating a photoresist on an active region and an edge region of a wafer, exposing the photoresist on the edge region to first ultraviolet rays, exposing the photoresist on the active region to second ultraviolet rays, depositing a first developing solution on the photoresist on the edge region to remove the photoresist on the edge region, and developing the photoresist on the active region using a second developing solution.
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Total number of triples: 40.