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filingDate 2011-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2014-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8841703-B2
titleOfInvention High electron mobility transistor and method of forming the same
abstract A semiconductor structure includes a first III-V compound layer. A second III-V compound layer is disposed on the first III-V compound layer and is different from the first III-V compound layer in composition. A carrier channel is located between the first III-V compound layer and the second III-V compound layer. A source feature and a drain feature are disposed on the second III-V compound layer. A gate electrode is disposed over the second III-V compound layer between the source feature and the drain feature. A fluorine region is embedded in the second III-V compound layer under the gate electrode. A gate dielectric layer is disposed over the second III-V compound layer. The gate dielectric layer has a fluorine segment on the fluorine region and under at least a portion of the gate electrode.
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