| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-30148 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-001
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-0004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06T1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-956
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06T7-00 |
| filingDate |
2013-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b15194763741c2c9d17a3e978f89f309
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c14428c7e04437e2a4996cc0e059293d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a3e25f78fde7c35812ccc3af3e2f265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96f33577aea9cc035bb8db5bfdc7b945 |
| publicationDate |
2014-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8824774-B2 |
| titleOfInvention |
Method and apparatus for inspecting patterns formed on a substrate |
| abstract |
The pattern inspection apparatus of the present invention performs comparison between images of regions corresponding to patterns formed to be same patterns, thereby determining mismatch portions across the images to be defects. The apparatus includes multiple sensors that synchronously acquire images of shiftable multiple detection systems different from one another, and an image comparator section corresponding thereto. In addition, the apparatus includes a means for detecting a statistical offset value from the feature amount to be a defect, thereby properly detecting the defect even when a brightness difference is occurring in association with film a thickness difference in a wafer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106373119-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10157456-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9767548-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016267647-A1 |
| priorityDate |
2005-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |