Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73df716a8c51a437e0abaf483bab7a75 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5157cc9d29989d27bd65a85902ddb054 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2103-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2101-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2101-34 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B13-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-034 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-268 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0738 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0853 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0622 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-064 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0665 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-40 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-00 |
filingDate |
2007-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2014-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63d22a36a9aae053a49bf7e998c95fdb |
publicationDate |
2014-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-8803027-B2 |
titleOfInvention |
Device and method to create a low divergence, high power laser beam for material processing applications |
abstract |
A thin beam laser crystallization apparatus for selectively melting a film deposited on a substrate is disclosed having a laser source producing a pulsed laser output beam, the source having an oscillator comprising a convex reflector and a piano output coupler; and an optical arrangement focusing the beam in a first axis and spatially expanding the beam in a second axis to produce a line beam for interaction with the film. |
priorityDate |
2006-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |