| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_555e5f4f999d91281b01312078b65ddc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cc49932af8a7938eea12730e56620832
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_219ebae1a22d522255bb58c91e87828a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_383eccc10059344c23c25f9b5f8613b0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5f4cefceb49b8345a674c8e1ca5a5bc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0018c1fa0e45efc00d77c52445273b33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4b443c70d8ccdd0e8017b5ace1ca5ff5 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-60 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2012-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b67ff8ac94c36202fac7c3bc50b01fa2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51bd9fefb96c7bfc52e331ffe292df9c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1caccded0d333de3438cb58beff2dec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4ac4421afd9f8254b44b10e799e36f9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b83e497bf89d4e9bc275651c9de3a47b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b6ed6112d05656867bc47193e10a5946 |
| publicationDate |
2014-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8765359-B2 |
| titleOfInvention |
Method of fabricating patterned functional substrates |
| abstract |
Methods of preparing organosilane-functionalized regions on a substrate surface and more specifically fabricating patterned functionalized substrates suitable to be optically read, the methods generally comprising employing a vapor deposition process of an organosilane gas onto a lithographically patterned silicon surface followed by removal of the patterning media in a bath of organic solvents and ultrasonic excitation. The inventive methods provide optimized surface density of functional species while avoiding deleterious effects that can occur when lithographically patterned substrates are exposed to various gaseous species during the functionalization process. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022192591-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023081728-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023192917-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10626013-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022159663-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023038859-A1 |
| priorityDate |
2012-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |