Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9ebbec1d263965139391504d9328f364 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_88fc7f9eb617072238851d46591a0c76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a42407c1f98a3435a70f61594413380 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3b0f8a3098b7214e87db6818fdbaffce |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66636 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-165 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02639 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66636 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7848 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-088 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823418 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823412 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-165 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-66 |
filingDate |
2011-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2014-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8128b13c8cd30e455660319ed270d14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_154a1134b89125eb5cfd263fd24594ea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_71f7d086472ea076fc9ab98b6e276f0b |
publicationDate |
2014-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-8754448-B2 |
titleOfInvention |
Semiconductor device having epitaxial layer |
abstract |
A semiconductor device includes a semiconductor substrate and a plurality of transistors. The semiconductor substrate includes at least an iso region (namely an open region) and at least a dense region. The transistors are disposed in the iso region and the dense region respectively. Each transistor includes at least a source/drain region. The source/drain region includes a first epitaxial layer having a bottom thickness and a side thickness, and the bottom thickness is substantially larger than or equal to the side thickness. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11728429-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9673296-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11222978-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9190471-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015294865-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021257260-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10943790-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013178024-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10269577-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9496149-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019252201-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013270611-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9012277-B2 |
priorityDate |
2011-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |