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publicationDate 2014-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8748252-B1
titleOfInvention Replacement metal gate transistors using bi-layer hardmask
abstract Methods of fabricating replacement metal gate transistors using bi-layer a hardmask are disclosed. By utilizing a bi-layer hardmask comprised of a first layer of nitride, followed by a second layer of oxide, the topography issues caused by transition regions of gates are mitigated, which simplifies downstream processing steps and improves yield.
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