| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9bceffddb90b9b3da8a772212961764b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8d537933be651c371d081a3d252cc59e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_342cb5c050686d2c06ef01e4b839de16 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-82
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24851
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-218
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24926
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-03 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01G31-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-0147
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C26-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00 |
| filingDate |
2008-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d4a69473b8ccef7114cbbde21337ffd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72a1d671e97a784eb9ac4a7b94d1cfc8 |
| publicationDate |
2014-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8715811-B2 |
| titleOfInvention |
Vanadium oxide thin film pattern and method of fabricating the same |
| abstract |
The present invention relates to a vanadium oxide thin film pattern which is fabricated by using APTS (3-aminopropyltriethoxysilane, H 2 NC 3 H 5 Si(OCH 3 ) 3 ) or the like to prepare an APTS-SAM or the like on the surface of a substrate, irradiating this APTS-SAM with vacuum ultraviolet light through a photomask to thereby modify amino-terminal silanes into silanol groups in the exposed area, and then depositing vanadium oxide in a liquid phase using a patterned self-assembled monolayer having the amino-terminated silane surface and silanol group surface as a template for patterning the vanadium oxide, to a method of fabricating the same, and to a vanadium oxide device. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11062946-B2 |
| priorityDate |
2007-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |