Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e74666e2ac07e6ef770cdfd1adbe035c http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d2dff73a3382d4224bc999cd54f37cdd http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d1a952d2f05d5086d63fce89fda0becf http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d5dbd80f96cc7da48a82bd2a65e6aa58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9def59921292b191085db24f787cd3c4 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-3857 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C43-56 |
filingDate |
2011-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2014-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be32e0149c5b1fcff76ad2344b598e22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bedd8241f9ea6be93f99c8cad909f7d3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fcf4c925525e3bafb3e89e9530deb42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1ed7e317215e0e8a869fb3260e6e069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_243d5db9826ef17523343c538d77e175 |
publicationDate |
2014-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-8690559-B2 |
titleOfInvention |
Nano-imprinting resin stamper and nano-imprinting apparatus using the same |
abstract |
The present invention provides a nano-imprinting resin stamper including a micro structure layer on a transmissive support basal material, the micro structure layer being formed of a polymer of a resin composition that contains a silsesquioxane derivative as a major constituent having a plurality of polymerizable functional groups, another polymerizable resin component having a plurality of polymerizable functional groups and different from the silsesquioxane derivative, and a photopolymerizable initiator, in which the content percentage of the photopolymerizable initiator is equal to or more than 0.3 mass % and equal to or less than 3 mass % relative to a total mass of the silsesquioxane derivative and the polymerizable resin component, and the micro structure layer permits equal to or more than 80% of light to pass therethrough at a wavelength of 365 nm. |
priorityDate |
2010-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |