| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1971b95ac5bfeec1110b29ea40296e8a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b7194ed8f2ae743e1552d7b6ccac2dc6 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F224-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F24-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F34-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2011-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb2855325819a139c73b1f18dfb7556f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eac616873f369a92ca0186393973c5a4 |
| publicationDate |
2014-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8647810-B2 |
| titleOfInvention |
Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor device |
| abstract |
A resist lower layer film-forming composition includes (A) a polymer that includes a cyclic carbonate structure. The polymer (A) includes a structural unit (I) shown by the following formula (1). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11573490-B2 |
| priorityDate |
2010-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |