| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d42d6ca4641b20d2c090d6bee4fa47ba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4aacafe8a6bf3f8b28a46678f3d51c25
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_71cd4059fe29d9cb0e8be7ab43dbd29b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_665bbbea46b9c1f7034bd0ea0fb96dd0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00 |
| filingDate |
2010-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59f9bdd332019e9508996d92a9003898
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9519ca465b101efd30fdf4ac47bf4d06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84e86377aceec8e7981772eaf43b1536
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a2c1f07819e54b4bd96056e014c1903 |
| publicationDate |
2014-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8636917-B2 |
| titleOfInvention |
Solution for forming polishing slurry, polishing slurry and related methods |
| abstract |
A solution for forming a polishing slurry, the polishing slurry and related methods are disclosed. The solution for forming a polishing slurry may include 1H-benzotriazole (BTA) dissolved in an ionic surfactant such as a sodium alkyl sulfate solution, and perhaps a polyacrylic acid (PAA) solution. The solution can be filtered and used in a polishing slurry. This approach to solubilizing BTA results in a high BTA concentration in a polishing slurry without addition of foreign components to the slurry or increased safety hazard. In addition, the solution is easier to ship because it is very stable (e.g., can be frozen and thawed) and has less volume compared to conventional approaches. Further, the polishing slurry performance is vastly improved due to the removal of particles that can cause scratching. |
| priorityDate |
2006-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |