| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c85d78c6a4459b5dbbc49c82a4c5c107
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_573818391597bd75de5f9ebd6b8fec25
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_49044ad734cfddc869a7e5eb9affeefa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fc35aefabe0813a2ab88069c21ce6b7f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-285 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2011-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29647a8944c01372afbe28050d2f4be6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9cccbd418648d264ba3452836fa5301
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6dc6bfc6ac91f023e028f607a45faa01 |
| publicationDate |
2014-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8628911-B2 |
| titleOfInvention |
Polymers, photoresist compositions and methods of forming photolithographic patterns |
| abstract |
Provided are polymers and photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022105753-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10691018-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11248076-B2 |
| priorityDate |
2010-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |