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publicationDate 2013-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8619828-B2
titleOfInvention Group III nitride semiconductor laser diode
abstract A group III nitride substrate has a semi-polar primary surface. A first cladding layer has a first conductivity type, and comprises aluminum-containing group III nitride. The first cladding layer is provided on the substrate. An active layer is provided on the first cladding layer. A second cladding layer has a second conductivity type, and comprises aluminum-containing group III nitride. The second cladding layer is provided on the active layer. An optical guiding layer is provided between the first cladding layer and the active layer and/or between the second cladding layer and the active layer. The optical guiding layer comprises a first layer comprising In x1 Ga 1-x1 N (0≦x1<1) and a second layer comprising In x2 Ga 1-x2 N (x1<x2<1). The second layer is provided between the first layer and the active layer. The total thickness of the first layer and the second layer is greater than 0.1 μm. The wavelength of laser light is in a range of 480 nm to 550 nm.
priorityDate 2009-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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