| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_916bf07d6def28c98bee1b33e1f30932 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2203-20 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C1-008 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-471
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-469
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-47
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B15-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105 |
| filingDate |
2013-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aec262f79e28a0443b775246675c1940 |
| publicationDate |
2013-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8603923-B2 |
| titleOfInvention |
Dipping solution for use in production of siliceous film and process for producing siliceous film using the dipping solution |
| abstract |
This invention relates to a dipping solution used in a process for producing a siliceous film. The present invention provides a dipping solution and a siliceous film-production process employing the solution. The dipping solution enables to form a homogeneous siliceous film even in concave portions of a substrate having concave portions and convex portions. The substrate is coated with a polysilazane composition, and then dipped in the solution before fire. The dipping solution comprises hydrogen peroxide, a foam-deposit inhibitor, and a solvent. |
| priorityDate |
2008-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |