http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8603363-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_664f5b543543aac4cf0153a4ef4e0f85 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_98625c2fc12250248738703231089b0c http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_565b87287bdd9bf79fd17183b8bbb9c7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c13726ceb32bab577ce30116f68a9325 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-564 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B32-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 |
| filingDate | 2012-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c74ff61915f9912a2e379ae28cd1aa52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d189476bba2ff29303d7aa56ddaae29f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc96ef4641705470a28c39c5f8412988 |
| publicationDate | 2013-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-8603363-B1 |
| titleOfInvention | Compositions for extending ion source life and improving ion source performance during carbon implantation |
| abstract | A novel method and system for extending ion source life and improving ion source performance during carbon implantation are provided. Particularly, the carbon ion implant process involves utilizing a dopant gas mixture comprising carbon monoxide and one or more fluorine-containing gas with carbon represented by the formula CxFy wherein x≧1 and y≧1. At least one fluorine containing gases with carbon is contained in the mixture at about 3-12 volume percent (vol %) based on the volume of the dopant gas mixture. Fluoride ions, radicals or combinations thereof are released from the ionized dopant gas mixture and reacts with deposits derived substantially from carbon along at least one of the surfaces of the repeller electrodes, extraction electrodes and the chamber to reduce the overall amount of deposits. In this manner, a single dopant gas mixture provides carbon ions and removes problematic deposits typically encountered during carbon implantation. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11264228-B2 |
| priorityDate | 2012-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 48.