| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_063a1b324005ddc15e16e7529c6258c4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5ef4ca62876d6ac1aad7a11da9e471e0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9d67d02df102dd50cda4c0b458d5e48d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89af0bde61ee35284d4fafcb598f1f67 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66803 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| filingDate |
2010-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a068f6e2185d8ae4678556983abfd87b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_883cecef311049d921ad6fd7907557e9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_524b992a0226750d17c23d5c34a0f22d |
| publicationDate |
2013-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8574972-B2 |
| titleOfInvention |
Method for fabricating semiconductor device and plasma doping apparatus |
| abstract |
After a fin-semiconductor region ( 13 ) is formed on a substrate ( 11 ), impurity-containing gas and oxygen-containing gas are used to perform plasma doping on the fin-semiconductor region ( 13 ). This forms impurity-doped region ( 17 ) in at least side portions of the fin-semiconductor region ( 13 ). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9627280-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9349659-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9812559-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014147943-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9093335-B2 |
| priorityDate |
2009-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |