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filingDate 2011-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2013-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8557502-B2
titleOfInvention Negative photosensitive composition, partition walls for optical device using it and optical device having the partition walls
abstract To provide a negative photosensitive composition applicable to preparation of partition walls which can maintain excellent ink repellency even after ink affinity-imparting treatment, and partition walls for an optical device using such a composition. n A negative photosensitive composition comprising the following ink repellent (A) in an amount of from 0.01 to 10 mass % to the total amount, a photosensitive resin (B) having an acidic group and an ethylenic double bond in one molecule, and a photopolymerization initiator (C), and partition walls for an optical device using such a composition:n Ink repellent (A): a hydrolyzed condensate of at least three hydrolyzable silane compounds, the three hydrolyzable silane compounds respectively selected from a trifunctional hydrolyzable silane compound having a C 3-10 perfluoroalkyl group which may contain an etheric oxygen atom, a bi- to tetrafunctional hydrolyzable silane compound, and a bi- or trifunctional hydrolyzable silane compound having a (meth)acryloyl group, which has a fluorine atom content of from 10 to 55 mass %.
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