Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_88ce28747561f0392676995b7e899cba http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d4cc4225117af954a9bad08f2f4eff4e |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D261-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-123 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-121 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D277-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D209-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D261-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-25 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-25 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-39 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
filingDate |
2012-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2013-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01a9eeb7725705b50c3d3c9fde53e374 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8f8fab14e3df21a917f4c85b22a9f97 |
publicationDate |
2013-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-8518630-B2 |
titleOfInvention |
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same |
abstract |
The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of the PAG is preferably a sulfonium or an iodonium cation. The photoresist composition further contains an acid sensitive imaging polymer. The photoresist composition is especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8906591-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8883395-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8871429-B2 |
priorityDate |
2010-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |