http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8500962-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ec085c13c99c5acddfd78cede1421be3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73caa096c33da80b58445fc0bc6281c8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1632b4d600e512677aa52dd543a3b076 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3408 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-347 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25B9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25B13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25B11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-32 |
| filingDate | 2011-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3e0ffc359750efd10e22cf433f7b858 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9e9abb0ff13434d700a89318dcef62f |
| publicationDate | 2013-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-8500962-B2 |
| titleOfInvention | Deposition system and methods having improved material utilization |
| abstract | A method for substrate processing includes producing a magnetic field by a magnetron across the full width of a sputtering surface of a target in a first direction. The magnetron can produce two erosion grooves separated by a distance S on the sputtering surface. The method includes moving the magnetron continuously at a first speed by the distance S in a first segment along a linear travel path. The linear travel path is along a second direction perpendicular to the first direction. The method includes continuously sputtering a material off the sputtering surface and depositing the material on the substrate during the first segment, and moving the magnetron by the distance S in a second segment along the linear travel path at a second speed higher than the first speed without sputtering the material off the sputtering surface or sputtering materials off at significant lower rate. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018269044-A1 |
| priorityDate | 2008-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 65.