http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8475642-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cb48f12b5c3acaeea453bf7775628243 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1721d75f5bf603447ec5a26b5c1c0be0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a452599f70ef405d97d4f80942ee5e07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8886ea044cd9ba71d2e6299c68ccb8aa |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-42 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-416 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-403 |
| filingDate | 2007-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c6edfe1d340d41b4959f1128f7df0d9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d84edc45123daca8dab793c860137fd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_382088f472bbac8caa976443f2d32c25 |
| publicationDate | 2013-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-8475642-B2 |
| titleOfInvention | Systems and methods for monitoring plating and etching baths |
| abstract | Methods and systems for monitoring electrolyte bath fluids are provided. The electrolyte bath fluids can be electroplating, electroless plating or etching solutions. The monitoring systems employ microfluidic devices, which have built in microfluidic channels and microfabricated thin-film electrodes. The devices are configured with fluid pumps to control the movement and mixing of test fluids through the microfluidic channels. The microfabricated thin-film electrodes are configured so that the plating or etching bath fluid composition can be characterized by electrochemical measurements. The monitoring methods and system provide faster measurement times, generate minimal waste, and occupy dramatically reduced physical space compared to conventional bath-monitor systems. The monitoring systems and method also provide low-cost system and methods for measuring or monitoring electroless plating bath rates. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11610783-B2 |
| priorityDate | 2005-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 53.