| abstract |
A solder bump confinement system is provided includes a substrate; a contact material patterned on the substrate; an inner passivation layer deposited over the contact material and the substrate; an under bump material pad over the contact material; an under bump material defining layer, having a bump opening contained therein, directly on the under bump material pad in which the under bump material defining layer has a thickness in the range of 200 Angstrom to 1500 Angstrom; and a system interconnect formed over the contact material and coupled to the under bump material defining layer and the under bump material pad through the bump opening. |