patent/US-8455371-B2

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8455371-B2

Outgoing Links

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filingDate	2009-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate	2013-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f404792727ccbd4ea4a5fa63a2d6e0b9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68ee801250bbfec726ffb8d60359e7d6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b47e96c09979293b2518f0cb918da5f
publicationDate	2013-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	US-8455371-B2
titleOfInvention	Sputtering target, method for forming amorphous oxide thin film using the same, and method for manufacturing thin film transistor
abstract	Disclosed is a sputtering target having a good appearance, which is free from white spots on the surface. The sputtering target is characterized by being composed of an oxide sintered body containing two or more kinds of homologous crystal structures.
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priorityDate	2008-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type	http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 83.