| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_caee263bf0168cf634723b9e3f04b84a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6ea808de78fc63b3cd8ad70ec7b71360
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ff88a02f32ff738a69e478877839f09f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0489fddf82f7e2f05fa1b23654563c3f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d5a7bdf060418be247c42187fe22e73c |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
| filingDate |
2008-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dce211560f6f946990d4c4bbe3dee7ef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce4dad4a084e3de49041d48c74ac7cd3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25cfe01b9e814d40136ee7a3a6e7ed95
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5aa32d26ebb4aead89a925e5021ad52b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a651ceb42b67f9856e6b1c38ff360381 |
| publicationDate |
2013-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8445166-B2 |
| titleOfInvention |
Fabrication method of lithography mask and formation method of fine pattern using the same |
| abstract |
There is provided a method of fabricating a lithography mask, the method including: forming a transparent polymer layer on a surface of a first substrate where a convex-concave pattern is formed; separating the transparent polymer layer from the first substrate, the transparent polymer layer having a convex-concave surface formed by the convex-concave pattern of the first substrate transferred thereonto; depositing a metal thin film on the convex-concave surface; forming a viscous film on a second substrate; disposing the transparent polymer layer on the second substrate such that the viscous film and metal thin film are partially bonded together; and separating the transparent polymer layer from the second substrate such that a portion of the metal thin film bonded to the viscous film is removed, wherein a metal thin film pattern having the portion of the metal thin film removed therefrom is formed on the convex-concave surface. |
| priorityDate |
2008-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |