| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3e1c0e7e5dff6dc1c7499c88d44fd205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_61fd34dcbaa44984c089de7dab4a74a5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_224c28f176217bd07d975a4237260dd1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2c344db9d612bd49abbb8340eb3edf53
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd06fd97f2c063b3670c9e606c12f363
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b16f7c3780b586a8d76fd5cbba2cd475
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7efb70292e596bfcb452ef1f71ad904a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate |
2011-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de6d475ee0786b40e52371511b90ce4e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d7b0485545f2a04b7114a327f092721
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84193f11444834452d35ba0b7ca75107
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3133cdba922b48c178c86c5d8c025bb8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1e82d056e06d7240978152e214d90fc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd9163681f0ad12e02efa7f691a47d86
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1ec9d738a5c632449b15ace02ea3838 |
| publicationDate |
2013-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8435718-B2 |
| titleOfInvention |
Upper layer-forming composition and photoresist patterning method |
| abstract |
An upper layer-forming composition includes a resin, and a solvent. The resin is dissolvable in a developer for a photoresist film which is to be covered by the upper layer-forming composition to form a pattern by exposure to radiation. The solvent dissolves the resin in the solvent. The solvent includes a compound shown by a formula (1). Each of R 1 and R 2 independently represents a hydrocarbon group having 1 to 8 carbon atoms or a halogenated hydrocarbon group.n nR 1 —O—R 2 (1) |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9507262-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10042258-B2 |
| priorityDate |
2005-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |