| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d60cbaf3bf845c902d1d075f29c0fcb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_782abfa2c5d96d418fd5470fb5ff435d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-205 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate |
2012-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2284cbf652b86f7517d9ce2b2ec3650
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_49be30b816e12f48209bfa5e1f46cd97 |
| publicationDate |
2013-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8431489-B2 |
| titleOfInvention |
Chemical mechanical polishing pad having a low defect window |
| abstract |
A chemical mechanical polishing pad having a polishing layer with an integral window and a polishing surface adapted for polishing a substrate selected from a magnetic substrate, an optical substrate and a semiconductor substrate, wherein the formulation of the integral window provides improved defectivity performance during polishing. Also provided is a method of polishing a substrate using the chemical mechanical polishing pad. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9259820-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9314897-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9333620-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9216489-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9064806-B1 |
| priorityDate |
2009-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |