Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_984e5c56cdaf54057fb553d7e5d9c754 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4b78b9997e4c80eaab83ff878199deb9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f236e6abf5df004107e470a43087f24f |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2933-0083 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-0093 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-22 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-00 |
filingDate |
2007-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2013-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74bcd8bd0ae8a2e8c8890d50fa67e2c0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c1e478a240c52554a59a89f0fc09cd7 |
publicationDate |
2013-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-8415186-B2 |
titleOfInvention |
Method of super flat chemical mechanical polishing technology and semiconductor elements produced thereof |
abstract |
The present invention provides a method of super flat chemical mechanical polishing (SF-CMP) technology, which is a method characterized in replacing laser lift-off in a semiconductor fabricating process. SF-CMP has a main step of planting a plurality of polishing stop points before polishing the surface, which is characterized by hardness of the polishing stop points material being larger than hardness of the surface material. Therefore, the present method can achieve super flat polishing surface without removing polishing stop points. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10388574-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11462442-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11043430-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10734288-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9627500-B2 |
priorityDate |
2007-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |