http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8405217-B2
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0aa485d286850898ac84bdb906bc1a41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf86017af7d0173b29b13629a40e43e6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_91d707049e15658d5c2200abb4e55cb7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_daad23a15b549165db036c2bd574d0cb |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76832 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-768 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-532 |
filingDate | 2007-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2013-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99994e4232b9aea4b04ce705fca4bd7a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ba9ced4a4eecf1879e9e1081fea87d0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8cc8c25bd25a00b78fc7ce28a009f064 |
publicationDate | 2013-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-8405217-B2 |
titleOfInvention | Coating method and solutions for enhanced electromigration resistance |
abstract | The present invention concerns a methods and compositions for preparing a multi layer composite device, such as a semiconductor device. Said method comprises (A) forming a dielectric layer on the surface of a composite material by bringing said surface into contact: a) either with a solution, comprising the diazonium salt of aniline, a diazonium salt bearing at least one functional group or an amine compound of formula H2N-A-X—Z as defined in claim 1: b) or with a first solution containing an aryl diazonium salt and successively a second solution containing a compound bearing at least one functional group and bearing at least one functional group capable of reacting with the aryl radical grafted on the surface of the composite material thanks to the aryl diazonium salt; (B) forming an overlayer on said surface of said composite material obtained in step (A), said overlayer consisting of a Si-containing dielectric Cu-Etch Stop Layer and/or copper diffusion barrier. |
priorityDate | 2006-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 77.