http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8405217-B2

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76832
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-768
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-532
filingDate 2007-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2013-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99994e4232b9aea4b04ce705fca4bd7a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ba9ced4a4eecf1879e9e1081fea87d0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8cc8c25bd25a00b78fc7ce28a009f064
publicationDate 2013-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8405217-B2
titleOfInvention Coating method and solutions for enhanced electromigration resistance
abstract The present invention concerns a methods and compositions for preparing a multi layer composite device, such as a semiconductor device. Said method comprises (A) forming a dielectric layer on the surface of a composite material by bringing said surface into contact: a) either with a solution, comprising the diazonium salt of aniline, a diazonium salt bearing at least one functional group or an amine compound of formula H2N-A-X—Z as defined in claim 1: b) or with a first solution containing an aryl diazonium salt and successively a second solution containing a compound bearing at least one functional group and bearing at least one functional group capable of reacting with the aryl radical grafted on the surface of the composite material thanks to the aryl diazonium salt; (B) forming an overlayer on said surface of said composite material obtained in step (A), said overlayer consisting of a Si-containing dielectric Cu-Etch Stop Layer and/or copper diffusion barrier.
priorityDate 2006-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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