Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_82e29b8b86193e501310b022650a4289 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6af9a57049d2d91c036d4f5ab49154cb http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_912be9b39b84236e3172b4416986db14 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76814 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76826 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76829 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-44 |
filingDate |
2010-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2013-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a90e09e4679d478f1de2676766d7274b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99d4d1b72d4e8fe7bf5a8324c6239a7a |
publicationDate |
2013-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-8399358-B2 |
titleOfInvention |
Establishing a hydrophobic surface of sensitive low-k dielectrics of microstructure devices by in situ plasma treatment |
abstract |
Silicon oxide based low-k dielectric materials may receive superior hydrophobic surface characteristics on the basis of a plasma treatment using hydrogen and carbon containing radicals. For this purpose, the surface of the low-k dielectric material may be exposed to these radicals, at least in one in situ process in combination with another reactive plasma ambient, for instance used for patterning the low-k dielectric material. Consequently, superior surface characteristics may be established or re-established without significantly contributing to product cycle time. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11670500-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10796898-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10312075-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017092487-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10529553-B2 |
priorityDate |
2009-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |