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publicationDate 2013-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8395187-B2
titleOfInvention Compound semiconductor epitaxial substrate and manufacturing method thereof
abstract A compound semiconductor epitaxial substrate having a pseudomorphic high electron mobility field effect transistor structure including an InGaAs layer as a strained channel layer and an AlGaAs layer containing n type impurities as a front side electron-donating layer, wherein said substrate contains an InGaP layer in an orderly state on the front side of the above described InGaAs layer as the strained channel layer.
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