| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5dbe68441251ac282a5a431aa643e43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1faa56fde50f3d5dea887426829aa1b9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7fb42f9653696b2c456510ff5ab67b04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3355b86fce7a0cfddc638ccd9bf6cc64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_190bb9d88a22642388152e817f842e2c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-76 |
| filingDate |
2009-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e6bb68d1f07e255b2ddb2ede2097d520
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38ad9d21ae7315a6fb697b5cd5c25d7e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_576e063e868970789e38ecd9069d6f71
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0cb6486b7bf9daec0c6ed1f324520b18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac12f93b540d2ba187bec3c5cf32dbc7 |
| publicationDate |
2013-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8373241-B2 |
| titleOfInvention |
Antireflective hard mask compositions |
| abstract |
The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins. |
| priorityDate |
2005-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |