http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8339026-B2

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47259d01303f75cc247fb1c9a67660a8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4637fb4664424d470a4d02a738cec9f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ef46822a67cefe77cbb5315c58e9b260
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6af5f2758e21a469085ec7b6ea5a3291
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f0c1254c456ecfd36f76e6142029cfb4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ac223783f35b29ae6b3338ace2749097
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1277
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1214
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K50-17
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K50-81
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-123
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-8051
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L33-00
filingDate 2011-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2012-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24b57406591a2ae096b1f02854b0a5cf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1bfae9657accf260f344cd7d527972f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6d96978c931e2d7a851bdedd638852a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b26cc24c219e49d33195b2145d1e56d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c8b6c7bcd67d3b1c9b1d6a319422118
publicationDate 2012-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8339026-B2
titleOfInvention Polycrystalline silicon as an electrode for a light emitting diode and method of making the same
abstract Metal induced polycrystallized silicon is used as the anode in a light emitting device, such as an OLED or AMOLED. The polycrystallized silicon is sufficiently non-absorptive, transparent and made sufficiently conductive for this purpose. A thin film transistor can be formed onto the polycrystallized silicon anode, with the silicon anode acting as the drain of the thin film transistor, thereby simplifying production.
priorityDate 2004-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0736059-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004222737-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6262441-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2001026257-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003129853-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5245452-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003038593-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6661180-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003227590-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004004433-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004232420-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003207589-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004207312-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5705829-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004245918-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003181043-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005173700-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004113544-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005227091-A1
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID128233967
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2733307

Total number of triples: 47.