| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b98fa2a076ae121fb6c40998faa1c892
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4c7041e69d917f73cd4955b969c8ccbe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b8872f69c25be5c14f9f75593be437b7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76883
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76849
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67196 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
2006-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d55b1970931e4a715748332236d3de2e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_074d8e3a5a4d33b0d3083fc6c17a7af1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4cca40ad8dccb8c7423a9cf77e7870c |
| publicationDate |
2012-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8322299-B2 |
| titleOfInvention |
Cluster processing apparatus for metallization processing in semiconductor manufacturing |
| abstract |
An apparatus includes an enclosure, at least one process chamber, a robot and at least one valve. The enclosure has a gas therein and at least one door configured to cover an opening into the enclosure. The gas includes at least one reduction gas. The robot is disposed within the enclosure and configured to transfer a substrate between the door and the process chamber. The valve is coupled to the enclosure. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011226324-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11482453-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11791209-B2 |
| priorityDate |
2006-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |