| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b9a255559e1d94f20510a17a673b1078
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_53709c12cbd785781760ad82e33ad808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4173efee0ac65674efb54f6e675ce7f4 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-249975
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29L2031-756
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2791-006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29L2011-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24661 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C44-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C44-3403
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C49-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C49-0042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29D22-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-12 |
| filingDate |
2008-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee04636c8b6a4bb012c8367c7d29d506
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db0c622b648830a3560240779ea7d5be |
| publicationDate |
2012-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8298651-B2 |
| titleOfInvention |
Hollow structure forming substrate, method of producing hollow structure forming substrate, and method of producing hollow structure using hollow structure forming substrate |
| abstract |
A hollow structure forming substrate includes: a surface on which a plastic-deformation film is formed by using a plastic-deformable material; a plurality of regularly-arranged gas-retaining spaces; a plurality of gas leading-out parts each having a first opening which faces corresponding one of the gas-retaining spaces and a second opening which faces the surface, the gas leading-out parts leads out gas retained in the gas-retaining spaces toward the surface under depressurized environmental condition; and a plurality of infiltration preventing spaces each provided in a space between corresponding one of the first openings and corresponding one of the second openings, in which the infiltration preventing spaces prevent infiltration of the plastic-deformable material from the surface into the gas-retaining spaces. |
| priorityDate |
2007-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |