| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1418fac9f42c948df152e41e5e5e4c10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3b9320675ad3e300d55742ab2f195600
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_64ca8009b5daf093db15075fe6d5df8a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2236 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-425 |
| filingDate |
2009-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8e108cc38be369866f9db9a54575d76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a3a367164664c0b741b4fc96b1372cf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8823d23f68b4c5b9b805119c36bd463 |
| publicationDate |
2012-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8288257-B2 |
| titleOfInvention |
Doping profile modification in P3I process |
| abstract |
Methods for implanting material into a substrate by a plasma immersion ion implanting process are provided. In one embodiment, a method for implanting material into a substrate includes providing a substrate into a processing chamber, the substrate comprising a substrate surface having a material layer formed thereon, generating a first plasma of a non-dopant processing gas, exposing the material layer to the plasma of the non-dopant processing gas, generating a second plasma of a dopant processing gas including a reacting gas adapted to produce dopant ions, and implanting dopant ions from the plasma into the material layer. The method may further include a cleaning or etch process. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I594301-B |
| priorityDate |
2008-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |