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publicationDate 2012-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-8252191-B2
titleOfInvention Sub-micron decal transfer lithography
abstract The present invention provides a method of sub-micron decal transfer lithography. The method includes forming a first pattern in a surface of a first silicon-containing elastomer, bonding at least a portion of the first pattern to a substrate, and etching a portion of at least one of the first silicon-containing elastomer and the substrate.
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