http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8168107-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dff540561785c78272820e716e525ec6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9038e0671de8842d33dbe4055000973d http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3741eecd96d6f4482403894af110fa36 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B28B11-08 |
| filingDate | 2009-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_239ab134b9fb3a4a06255294e8ac6636 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c0f8f899e5eef7192aa5553a00f6f933 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fd608d1d315f4bd295128a0047494c0 |
| publicationDate | 2012-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-8168107-B2 |
| titleOfInvention | Method of forming a pattern using nano imprinting and method of manufacturing a mold to form such a pattern |
| abstract | Example embodiments relate to a method of forming a three-dimensional micro pattern or a multi-step pattern using a nano imprinting process and a method of manufacturing a mold to form such a pattern. A molding polymer may be patterned in a one-step shape on a substrate having UV barrier patterns, thereby easing the manufacture of a mold for multi-step imprinting and simplifying the formation of a multi-step pattern using the one-step shaped mold by avoiding the repetition of more complicated processes. Consequently, it may be possible to form a relatively large-area micro pattern, a relatively large-area pattern usable in flat panel displays, and a nano pattern having a size of several tens of nanometers in a semiconductor process, thereby contributing to the reduction of process costs, the reduction of process time, and the improvement of production yield. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017203330-A1 |
| priorityDate | 2008-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.