| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_52799b53456362730575359ff0dbba54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a7d652555853327305a8dc6b5dcbe533
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f93194ec692fcf68e10d27f9e3857125 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00659
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00722
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00608
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00617
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00637
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00626
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00621
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00635
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00317 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-54353 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2008-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3624e47ae2b038aa4002a3520e8f9df7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5c4e38a7b3020315467932c5359bae5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ce6493008e5d6e950657658db169ee9 |
| publicationDate |
2012-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8148053-B2 |
| titleOfInvention |
Method for manufacturing substrate for making microarray |
| abstract |
To provide a method for manufacturing a substrate for making a microarray which will ensure the secure immobilization of a material in a site-selective manner at a low cost. The method comprises the steps of: forming a monomolecular film on the surface of a substrate using a silane compound represented by the following general formula (1),n nY 3 Si—(CH 2 ) m —X  (1),n wherein m represents an integer from 3 to 20; X represents a hydroxyl group precursor functional group which will be converted to a hydroxyl group when exposed to acid; and Y independently represents a halogen atom or alkoxy group having 1-4 carbon atoms; and converting the hydroxyl group precursor functional group represented by X to a hydroxyl group; wherein the step of converting a hydroxyl group precursor functional group represented by X to a hydroxyl group comprises forming, on the monomolecular film, a polymer layer containing a compound represented by the following general formula (2) or (3), |
| priorityDate |
2007-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |