| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d34f537cf9f0bd25f4c54114dcfb5b42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c1e63190a974e79390f4bde606e56f38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_65967a8a3054e5daa2c3a386ae483312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cb1c598071a34cec2b7ef0dd4b6fe049
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d5ed6e3e3ae4388b606ae3603f218bf4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f5324dc28355e8fc63a358525092c7b7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_53456d3b034bd8333eb44c69b9391180
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bdedcc666e04d740727ee4a6b706fa47 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2006-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_833594a44f32cdf4eb14e007410ef861
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94258b54abe040c85740c72209a3c47d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_42f867855ce4e6b967ef51c810b31ad3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4dc48189a5a25ec80a6ce92773a7481
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50f0f349e30aabbcaf7a4efa715f4ef7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b36dd0043ffb77f88ba0236f7f7d2f10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa3df2ee059ee843ddc2ca37397d5619
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_048d3dbf1fb2276e3a71ae54a63d2b5c |
| publicationDate |
2012-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8147711-B2 |
| titleOfInvention |
Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry |
| abstract |
Disclosed is an adjuvant for controlling polishing selectivity when polishing a cationically charged material simultaneously with an anionically charged material. CMP slurry comprising the adjuvant is also disclosed. The adjuvant comprises: (a) a polyelectrolyte that forms an adsorption layer on the cationically charged material in order to increase the polishing selectivity of the anionically charged material; (b) a basic material; and (c) a fluorine-based compound. when the adjuvant for controlling polishing selectivity of CMP slurry according to the present invention is applied to a CMP process, it is possible to increase the polishing selectivity of a silicon oxide layer, to obtain a uniform particle size of CMP slurry, to stabilize variations in viscosity under an external force and to minimize generation of microscratches during a polishing process. Therefore, the adjuvant for CMP slurry according to the present invention can improve reliability and productivity during the fabrication of very large scale integrated semiconductors. |
| priorityDate |
2005-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |